Abstract
The circuitry solutions, design, and main parameters of a modular pulse bipolar power-supply unit for high-power ion-plasma facilities are described. The modular principle of designing power supplies provided their application in various processes. The results of tests of the developed device as the power supply of a magnetron sputtering system with a power of 60 kW and a high-voltage power supply of the substrate bias voltage with a power of up to 40 kW are presented. The efficiency of applying bipolar pulses for preventing arcing at the magnetron cathode is experimentally demonstrated.
